√.Advantages of the Microwave frequency of 2.45 GHz.
√.Removal of photo resist after high dose implantation.
√.After or before wet or dry etching
√.SU 8 and other resists based on epoxy process.
√.Sacrificial layers in MEMS fabrication.

The Plasma System series Q prepared for the installation in a cleanroom wall as well as a table top system.The system is suitable for wafers up to 200 mm and designed for semiconductor and microelectronics industry.