UNITEMP
RAPID THERMAL ANEALING OVENS

RTP100HV
RTP100
RTP150
RTP150HV
VPO1000300
RTP100HV
RTP100
RTP150
RTP150HV
VPO1000300

UNITEMP thermal processing oven have variety of model to serve customer needs. The difference model of this thermal processing oven serve the purpose of different application likes Annealing for silicon and compound in semiconductor wafers (RTA), Rapid Thermal Oxidation (RTO), Rapid Thermal Nitration (RTN), Rapid Thermal diffusion from spin on Dopant, Crystallization, Contact Alloying and more.

 

MODEL        RTP-100 RTP-100-HV  RTP-150 RTP-150-HV VPO-1000-300
Max subtract size 100X100mm 100x100mm 156x156mm 156x156mm 300x300mm
Tmax 1200 c 1200 c 1000 c 1000 c 1000 c
T C max 1200 c 1200 c 1000 c 1000 c 1000 c
Ramp up rate 150K/Sec 150K/Sec 75k/sec 75k/sec 40k/sec
Vacuum up to 10-3h Pa 10-6hPa 10-3hPa 10-6hPa 10-3hPa
Flowmeter MFC MFC MFC MFC MFC
Controller SIMATIC R SIMATIC R SIMATIC R SIMATIC R SIMATIC R
Touch Panel 7” 7” 7” 7” 7”
Dimension 504x504x570mm 504x504x690mm 504x504x570mm 504x504x690mm 504x504x680mm