ALPHA PLASMAAL76For Polymide Removal
AL 76 for Polymide removal is a production type of Plasma Asher which can be use to remove the photoresist on the wafer. The AL 76 use the microwave plasma etching method for removal of SU 8 and others resist based on epoxy. Others then a mass production Plasma Asher, this system also can use it capabilities to improve the wire bonding, flip chip underfill and molding.
|Microwave Power||2.45GHz adjustable between 50 to 1200 watts|
|System Dimension||W1050 x H2020 (with light tower) x D800 (mm)|
|Chamber Dimension||W400 x H400 x D490 (mm)|
|Loading||Single platform loading
Wafer Cassette (up to 12” wafer)
Temperature Control Chuck Loading (optional)